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BISTRIAZENE POLYURETHANES: SYNTHESIS, CHARACTERIZATION AND PHOTOBEHAVIOR


BURUIANĂ EMIL 1 *, MELINTE VIOLETA 1, BURUIANA TINCA 1, SIMIONESCU BOGDAN 1, LIPPERT THOMAS 2
(1)PETRU PONI INSTITUTE OF MACROMOLECULAR CHEMISTRY, 700487 IAŞI, ROMANIA (2)PAUL SCHERRER INSTITUT, 5232 VILLIGEN PSI, SWITZERLAND *CORRESPONDANCE: EMILBUR@ICMPP.RO

Issue:

SCSCC6, Volume VII, No. 1

Section:

Volume VII - No. 1 (2006)

Abstract:

Two new bistriazene diols, 1,1’[4,4’-diphenyl]-3,3’-di(ß-hydroxyethyl methyl)-bistriazene (TDF) and 1,1’[4,4’-diphenylsulphone]-3,3’-di(ß-hydroxyethyl methyl)-bistriazene (TSO) were synthesized via an electrophilic N-N coupling between a quaternary ammonium salt and Nmethyl-monoethanol amine. These monomers were used as co-partners in polyaddition with 2,4-tolylene diisocyanate (2,4- and 2,6-TDI isomer mixture, 80:20 v/v) or 4,4’ methylene diisocyanate, respectively, in order to obtain new hard type polyurethanes. The photosensitivity of monomers and polymers was evaluated by UV irradiation, in methanol or DMF solution and as thin films following the disappearance of the p-p* absorption band from the UV spectra corresponding to the triazene chromophore. As a novel trend, the bistriazene polyurethanes were structured by laser irradiation (? = 308 nm) in order to evaluate their ability to deliver efficient materials in microlithography.

Keywords:

bistriazene diol, polyurethane, photosensitivity, UV irradiation, laser ablation.

Code [ID]:

CSCC6200607V01S01A0013 [0001072]

Full paper:

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