A thin films deposition system using a combination between magnetronsputtering deposition technique and deposition from hydrocarbon gases in rf discharge (glowdischarge) is presented. The installation was developed in Bacau University laboratories inorder to optimize the deposition process. With the studied system, the high energy of thesubstrate incident species, specific to sputtering deposition, is combined to the high methanedecomposition from glow discharge process.
