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OPTIMIZED THIN FILMS DEPOSITION SYSTEM


LAZÄ‚R GABRIEL, VASCAN IOAN, STAMATE MARIUS, LAZÄ‚R IULIANA, RUSU IOAN
UNIVERSITATEA DIN BACÄ‚U

Issue:

MOCM, Number 11, Volume II

Section:

Optimization In Environmental Engineering And Environmental Protection

Abstract:

A thin films deposition system using a combination between magnetronsputtering deposition technique and deposition from hydrocarbon gases in rf discharge (glowdischarge) is presented. The installation was developed in Bacau University laboratories inorder to optimize the deposition process. With the studied system, the high energy of thesubstrate incident species, specific to sputtering deposition, is combined to the high methanedecomposition from glow discharge process.

Keywords:

magnetron sputtering, plasma, glow discharge.

Code [ID]:

MOCM200511V02S01A0007 [0000352]


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