Titanium dioxide films were deposited on silicon substrates by a PECVD torch. A static mode, with a stationary substrate in front of the plasma, and a dynamic mode, with a moving substrate in front of the plasma along the x axis, were studied. The aim was to replicate, using the dynamic mode, the columnar structure composed of anatase monocristals obtained in static mode. These results showed that the process parameters, as the precursor flow rate and the torch-substrate distance, have a critical role to control the film morphology in dynamic mode to obtain a promising microstructure.
