Quick search
Go!

NON-DESTRUCTIVE THIN FILM MATERIAL CHARACTERIZATION USING KLYSTRON CAVITY


VALERIE MADRANGEAS 1, DOMINIQUE CROS 1, MICHEL AUBOURG 1, DAMIEN PASSERIEUX 1, JEAN-MICHEL LE FLOCH 2, YAOHUI FAN 2, MICHAEL EDMUND TOBAR 2
1. XLIM UMR 7252, CNRS/ Université de Limoges, 123 avenue Albert Thomas, 87060 Limoges Cedex, France
2. ARC Centre of Excellence Engineered Quantum Systems- University of Western Australia, 35 Stirling Hwy, 6009 Crawley, Australia

Issue:

PLUMEE, Number 1, Volume I

Section:

Issue No. 1 - Volume 3(2013)
Download the full manuscript(authorisation required)

Abstract:

This paper presents two specific methods to determine the high frequency dielectric properties of deposited thin films on substrates. One uses two dielectric resonators facing each other inside a cylindrical cavity and the other method is based on the use of Klystron cavities. While introducing one sample at the time into the resonant cavity, we measured shifts from the two-mode resonance frequencies and their associated unloaded quality factors. These latter allow retrieving the permittivity and loss tangent of the sample under test by using rigorous electromagnetic simulation software.

Keywords:

Dielectric thin films, non-destructive characterization, permittivity, loss tangent.

Code [ID]:

PLUMEE201301V01S01A0032 [0003988]

DOI:

Full paper:

Download pdf


Copyright (c) 1995-2007 University of Bacău