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ELABORATION AND CHARACTERIZATION OF TixHf1-xN THIN FILMS


DESBORDES GUILLAUME1, 2, JAOUL CĂ©DRIC 1, DUBLANCHE-TIXIER CHRISTELLE 1, HUSSON FABIEN 2, TRISTANT PASCAL
1 Université de Limoges, CNRS, Institut de recherche sur les céramiques IRCER, UMR 7315, 12 rue Atlantis, 87068 Limoges
2 Centre d’ingĂ©nierie en traitements et revĂȘtements de surfaces avancĂ©s CITRA, 16 rue Atlantis, 87068 Limoges

Issue:

PLUMEE, Number 1, Volume IX

Section:

Issue No.1 - Volume 9 (2019)

Abstract:

Titanium nitride is a ceramic coating where titanium and nitrogen form a

crystalline compound with a face-centered cubic structure that has a relatively high hardness

(25 GPa) and good adhesion on many substrates. However, temperature stability is limited

to about 500 °C. Among the elements to improve this property (like Al, Si, ..) it was decided

to study the influence of hafnium. Ti-Hf-N thin films were deposited on Si substrates by

reactive co-sputtering with a fixed power on the Ti target and variable power on the Hf

target. This led to the formation of TixHf1-xN single-phase coating with a variable

composition. The Hf /(Ti + Hf) ratio was varied between 0.23 and 0.70. When the titanium

is substituted by the hafnium, the conical columnar microstructure is replaced by a dense

and amorphous-like microstructure. The maximum hardness (30 GPa) is reached for a ratio

Hf / (Ti + Hf) = 0.51.

Keywords:

Reactive Sputtering, Thin films, Titanium nitride, Hafnium nitride, Hardness.

Code [ID]:

PLUMEE201901V09S01A0011 [0004979]

Note:

DOI:

Full paper:

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